
Our first product, SlurryScope, is an automated system designed for real-time particle examination...at point of use.
The SlurryScope can be used for on-site beta testing of multiple slurry types; correlating to previous dilution tests of slurry samples (Silica and Alumina)
- Undiluted ceria and colloidal-silica slurries measured by multiple customers on slurry delivery line >200 hours continuous monitoring.
- All slurries measured in real-time with time-stamped results sent to customer database.
As slurry is delivered to the chamber, SlurryScope takes particle data in real-time. The data is time stamped allowing it then to be correlated to the specific wafers processed.
SlurryScope is aimed at preventing defects that are caused by large particles in the slurry and for characterizing the particle distribution delivered to each wafer. It can be used to extend the life of slurry filters...improve the consistency of CMP results... and lower the cost of wafer processing.
SlurryScope eliminates the need for dilution, (a technique currently used to "see through" the slurry), and its associated errors.
SlurryScope Customer Benefits
- Identify and measure LPC real-time in CMP slurry to prevent wafer defects and scratching.
- Compare distribution of particles by size, slurry type and condition to improve process results.
- Correlate wafer results by continuous undiluted slurry examination during CMP processing.
- Reduce CMP costs via slurry and filter life cycle improvements
- Increase slurry utilization and reduce costs by continuous monitoring slurry in CMP processing.